Publications

Publications

Filename	Filesize
1969.Applied Optics.Gerhardt.A normal Incidence Scanning Reflectometer of High Precision.pdf	501K
1971.PRL.Rubloff.far_uv_refl_ionic_xtals.PRL_26_1317_(1971).pdf	970K
1971.PhysRev.Rubloff.Normal-Incidence Reflectance Optical Properties and Electronic Structure of Zn.pdf	1426K
1971.RevSciInstr.Rubloff.synch_rad_solids.pdf	668K
1972.PRL.Pollak.piezoopt_lambda_Si.PRL_29_(12)_789_(1972).pdf	820K
1972.PhysRev.Rubloff.Far-Ultraviolet Reflectance Spectra and the Electronic Structure of Ionic Crystals.pdf	4036K
1973.PRL.Bergstresser.loc_field_far_uv_ionic_xtals.PRL_30_(17)_794_(1973).pdf	653K
1974.JVST.Anderson.surf_refl_chemisorp_W.JVST_11_271_(1974).pdf	76K
1974.PRL.Rubloff.opt_refl_surf_states_chemisorp_W.PRL_32_667_(1974).pdf	787K
1974.Phys Rev.Anastassakis.Resonance Raman scattering under (111) uniaxial stress in the region of the E1 gap in InAs.pdf	608K
1974.PhysRev.Anderson.Surface reflectance spectroscopy studies of chemisorption on W(100).pdf	2980K
1976.JVST.Rubloff.Orbital shifts associated with chemical bonding of organic molecules on ZnO nonpolar surfaces.pdf	121K
1976.JVST.Rubloff.ups flash des methanol Ni.JVST 14 419 (1977).pdf	569K
1976.PhysRev.Rubloff.Unusual extramolecular relaxation-polarization shifts of low-lying orbitals.pdf	1573K
1978.APL.Weinberg.exciton transport SiO2.APL 32 184 (1978).pdf	269K
1978.PhysRev.Rubloff.Surface optical excitations associated with CO chemisorption on Ni(111).pdf	1715K
1979.JApplPhys.Weinberg.Exciton or hydrogen diffusion in Si02.pdf	356K
1979.JVST.Ho.chem struct Pd-Si.JVST 16 1120 (1979).pdf	1543K
1979.PRL.Freeouf.micro_compound_form_Pd-Si.PRL_43_(24)_1836_(1979).pdf	717K
1979.PhysRev.Weinberg.Transmission photoconductivity and the experimental band gap of thermally grown Si02 films.pdf	1965K
1980.JVST.Freeouf.react Schottky barr form.JVST 17 916 (1980).pdf	627K
1980.PhysRev.Ho.Chemical bonding and electronic structure of Pd2Si.pdf	1118K
1981.JVST.Clabes.Electronic structure of the VSi Interface.pdf	209K
1981.JVST.Rubloff.SummAbst-Site-speciic densities of states for cleaved and sputtered GaAs -100-from Auger line shapes.pdf	240K
1981.JVST.Schmid.el states atom struct Pd-Si.JVST 18 937 (1981).pdf	758K
1981.PhysRev.Rubloff.Chemical bonding and reactions at the PdSiinterface.pdf	2521K
1982.JVST.Clabes.V-Si.JVST 20 684 (1982).pdf	94K
1982.JVST.Purtell.Scottky barrier formation at PdSi-111-and VSi-111-interfaces.pdf	287K
1982.Phys.Rev.Rubloff.Interface states at the Pt silicide-Si interface.pdf	568K
1982.PhysRev.Rubloff.Interface states at teh Pt silicide-Si interface.pdf	568K
1983.JVST.Butz.Ti-Si and Ti-oxy-Si at Si interface.JVST A 1 (2) 771-775 (1983).pdf	599K
1983.JVST.Purtell.Schott barr Pd Pt Ni.JVSTA 1 566 (1983).pdf	449K
1983.SurfSci.micro silicide interfaces.SurfSci 132 268-314 (1983).pdf	12K
1984.APL.Tsang.Raman PtSi.APL 44 430 (1984).pdf	298K
1984.JVST.Hahn.chem bond polyimide surf.JVST A 2(2) 756 (1984).pdf	549K
1984.JVST.Matz.Pt-Si.JVSTA 2 253 (1984).pdf	1234K
1984.JVST.Tsang.Raman Spectroscopy of Silicide Formation at the Pt-crystalline Si Interface.pdf	859K
1984.PhysRev.Clabes.Chemical Bonding and Schottky Barrier Formation at VSi Interfaces.pdf	2946K
1984.PhysRevB.Butz.Ti-Si reaction interface.PhysRev B 30, 5421-5429 (1984).pdf	3457K
1985.JVST.Ho.chem bond metal-polymer.JVSTA 3 739 (1985).pdf	1614K
1985.JVST.Liehr.Pt-ox-Si Ti-ox-Si.JVSTA 983 (1985).pdf	1555K
1985.JVST.Purtell.High Resolution Synchrotron Photoemission Study of Silicon-Metal Interface.pdf	341K
1985.PRL.Tromp.high_temp_SiO2_decomp.PRL_55_(21)_2332_(1985).pdf	988K
1986.APL.Hofmann.defect form SiO2 hi-temp anneal.APL 49 1525 (1986).pdf	374K
1986.APL.Rubloff.mat react refract-Si.APL 48 1600 (1986).pdf	418K
1986.JVST.Rubloff.High Temperature Decomposition of SiO2 at the Si-SiO2 Interface.pdf	300K
1986.JVST.Tromp.mat react Ti-Si interface.JVST A 4(3) 865 (1986).pdf	630K
1986.PhysRev.Liehr.Influence of thin Si02 interlayers on chemical reaction...pdf	3489K
1987.JAP.Hofmann.Hole trapping in SiO2 films annealed in low-pressure oxygen atmosphere.pdf	1190K
1987.JAP.Hofmann.Role of oxygen in defect-related breakdown in thin SiO2 films on Si-100.pdf	559K
1987.JVST.Liehr.kinetics_ox_decomp.JVST_A_5_1559_(1987).pdf	835K
1987.JVST.Renier.Integ Sys.JVST A5(4) 2098-99 (1987).pdf	280K
1987.PRL.Rubloff.defect_microchem_at_ox_Si_interface.PRL_58_2379_(1987).pdf	316K
1987.Phys.Rev.Rubloff.Defect Microchemistry at the SiO2-Si Interface.pdf	584K
1989.JVST.Oehrlein.surf analysis realistic microstructs.JVSTA 7 1030 (1989).pdf	979K
1989.JVST.Rubloff.Maskless selected area processing.pdf	1679K
1989.Phys.Rev.Rubloff.Microvoids and Defect Chemistry...pdf	760K
1989.PhysRev.Rubloff.Microvoids and Defect Chemistry...pdf	760K
1990.APL.Kasi.vapor phase hydrocarbon removal.APL 57 2095 (1990).pdf	596K
1990.APL.Liehr.kinetics Si epi.APL 56 629 (1990).pdf	553K
1990.APL.Offenberg.ultra integ therm oxide.APL 57 (12) 1254-56 (1990).pdf	672K
1990.JVST.Heald.X-Ray Reflectivity Study of SiO2 on Si.pdf	442K
1990.JVST.Rubloff.defect microchem.JVST A 8(3) 1857 (1990).pdf	1339K
1991.APL.Kasi.chem F oxid Si.APL 58 (25) 2975-77 (1991).pdf	406K
1991.APL.Kasi.hydrocarbon HF clean MOS.APL 59 108 (1991).pdf	420K
1991.APL.Leung.positron MOS centroid shift.APL 58 86 (1991).pdf	465K
1991.JVST.Offenberg.Surface etching and rougheningin integrated processing of thermal oxides.pdf	1665K
1991.PhysRev.Asoka-Kumar.Si02Si Interface properties usingpositrons.pdf	705K
1992.APL.Cohen.mechanisms Cu CVD.APL 60 50 (1992).pdf	416K
1992.APL.Cohen.selectivity Cu CVD.APL 60 1585 (1992).pdf	410K
1992.APL.Dana.kin_nucl_Si_on SiO2.APL_61(25)_3035_(1992).pdf	483K
1992.APL.Jeng.anom F diffus Si.APL 61 1310 (1992).pdf	373K
1992.APL.Lin.ps ultrasonics TiSi2.APL 61(22) 2700 (1992).pdf	410K
1992.APL.Tas.ps ultrasonics CFx.APL 61 2700 (1992).pdf	329K
1992.IBM JRD.Rubloff.integ proc.IBM J Res Devel 36(2) 233-276 (1992).pdf	6174K
1992.JAP.Leung.Positronannihilation at the SiSiO2 Interface.pdf	378K
1992.JAP.Weinberg.Positron annihilation studies in the field inuced depletion regions of metal-oxide-semiconductor structures.pdf	476K
1992.JVST.Liehr.nucl Si on SiO2 by H2 desorp.JVST A 10 (4) 869-873 (1992).pdf	626K
1993.APL.Dana.rough_Si_CVD.APL_63(10)_1387_(1993).pdf	437K
1994.IEEE-TSM.Rubloff.integ MOS proc.IEEE-TSM 7(1) 96-100 (1994).pdf	499K
1994.JAP.Szeles.implant F diffusion in Si.JAP 76(6) 3403 (1994).pdf	1021K
1994.JVST.Liehr.competitive microelectronics.JVSTB 12(4) 2727 (1994).pdf	1929K
1995.JVST.Shareef.O3 TEOS trench fill.JVST B 13(4) 1888 (1995).pdf	305K
1995.JVST.Tedder.product diag RTCVD mass spec.JVST B 13(4) 1924 (1995).pdf	118K
1996.JVST.Shareef.gas_phase_SA-TEOS.JVST_B_14(2)_772_1996.pdf	69K
1996.JVST.Tedder.polySi mass spec.JVST A 14(2) 267-270_(1996).pdf	97K
1997.FIE.ISR techrep.Lu.educ in semicond mfg.ISR-TR 97-4 (1997).pdf	384K
1997.IEEE-TSM.Lu.contam_ctrl_gas_deliv.IEEE-TSM_10(4)_425-432_(1997).pdf	208K
1997.IEEE-TSM.Lu.polySi ESH optimiz.IEEE-TSM 10(3) 390-398 (1997).pdf	284K
1997.JVST.Chowdhury.PECVD_amorph_Si_mass_spec.JVST_B_15(1)_127-132_(1997).pdf	122K
1998.IEEE-TSM.polySi RTCVD dyn simul.IEEE-TSM 11(1) 63-74_(1998).pdf	272K
1998.ISR techrep.Chang.Ulvac W CVD model reduction.pdf	212K
1998.ISR techrep.Rose.SimPLE framework.pdf	367K
1999.CSCL'99.Plaisant.design history mechs & collab simul.pdf	234K
1999.ISR techrep.Ulvac dyn simulator.pdf	219K
1999.JVST.Lu.SiH4 N2O oxide CVD mass spec.JVST B 17(4) 1417 (1999).pdf	103K
1999.Proc ACC 1999.Sreenivasan.SimPLE control.ACC 1 485-489 (1999).pdf	497K
1999.Proc CSCL.Plaisant.learninghistorian.paper.pdf	397K
2000.CHI'00.Rose.Simul based learning & histories.pdf	297K
2000.CHI-2000.learning_histories.pdf	397K
2000.IEEE-Trans.Semicond.Manuf.Hermann.Evaluating the Impact of Process Changes onCluster Tool Performance.pdf	217K
2000.JVST.Gougousi.mass_spec_H2-WF6_metrology.JVST_B_18(3)_1352-63_(2000).pdf	851K
2000.Proc ACC 2000.Sreenivasan.SimPLE_control.ACC 5 3458-3462 (2000).pdf	364K
2000.Proc LEOS 2000.Green.CRDS.LEOS 1115-1116 (2000).pdf	139K
2000.Proc NIST Char Metrol.Gougousi.mass spec & r2r.AIP CP-550 249-253 (2001).pdf	47K
2000.Proc WinterSim 2000.Herrmann.heterogeneous sim envir.WinterSim 2000 2 1491-1498_(2000).pdf	983K
2001.JVST.Chang.wafer temp CVD.JVST B 19(1) 230 (2001).pdf	183K
2001.JVST.Lecordier.acoustic_sensor_metrol.JVST_A_19(2)_621-626_(2001).pdf	176K
2001.JVST.Sreenivasan.r2r ctrl W CVD low press.JVST B 19(5) 1931 (2001).pdf	298K
2002.JVST.Xu.realtime_MS_endpt.JVST_20(6)_2351_(2002).pdf	761K
2002.Langmuir.Wu.volt dep assy chitosan.Langmuir 18(22) 8620 (2002).pdf	149K
2003.Adv Chitin Science.Wu.chitosan at interface microfab & biotech.Adv Chitin Science.EUCHIS Montreal 2003.pdf	398K
2003.ICCM.Lazzeri.low-K char.Proc ICCM Austin Mar2003 551-555 (2003).pdf	316K
2003.ICCM.Rubloff.realtimeAPC.Proc_ICCM_Austin Mar2003 583-591 (2003).pdf	1848K
2003.IEEE Sensors Materials.Kastantin.invited bioMEMS.IEEE Sensors Materials 15 (6) 295-311 (2003).pdf	170K
2003.JVST.Lecordier.W CVD acoustic metrol 10 torr.JVST_B 21(3) 1055 (2003).pdf	249K
2003.JVST.Lucov Rubloff.AVS el mats proc.JVST 21(5) S175-81 (2003).pdf	41K
2003.Langmuir.Chen.nature-inspired protein-polysacch.Langmuir 19(22) 9382-86 (2003).pdf	281K
2003.Langmuir.Fernandez.electrodep_hydrogel.Langmuir 19(10) 4058-62 (2003).pdf	377K
2003.Langmuir.Wu.spat chitosan.Langmuir 19(3) 519 (2003).pdf	329K
2003.Transducers.Wu.volt-prog_biofunct.Proc_Transducers_(2003).pdf	184K
2004.Anal Chem.Yi.robust assy nucleic.Anal Chem 76 (2) 365-372 (2004).pdf	278K
2004.Cho.mass spec W CVD 10 torr.JVST B 22(3) 880-887 (2004).pdf	571K
2004.IEEE TSM.Cho.dyn sim ESH Cu CVD.IEEE TSM 17(3) 455-469 (2004).pdf	930K
2004.JVST.Henn-Lecordier.acoustic source ctrl.JVST A 22(5) 1984-1991 (SepOct 2004).pdf	195K
2004.Langmuir.Fernandes.thermo-biolithography.Langmuir 20 (3) 906-913 (2004).pdf	258K
2004.Surf Interf Analy.Lazzeri.ToF-SIMS PMSSQ.Surf Interf Analys 36 304-310 (2004).pdf	191K
2005.AIChE J.Choo.sim based des eval spat cvd.AIChE J 51 (2) 572-584 (2003).pdf	456K
2005.Biomacromolec.Yi.Biofab_w_chitosan.6(6)_2881-94.pdf	543K
2005.JVST-B.Lazzeri.PMSSQ_curing.JVST-B_23_908-917_(2005).pdf	550K
2005.JVST.Cho.AlGaN_cap_thickness_ctrl.JVSTB_23(5)_2007-2013_(SepOct2005).pdf	500K
2005.JVST.Cho.crystal_quality.JVST_B_23(4)_1386-1397_(2005).pdf	580K
2005.JVST.Cho.fault_detection.JVST_B_23(5)_1849-1855_(2005).pdf	436K
2005.Lab_on_Chip.Powers.biophotonics.Lab_on_Chip_5_583-586_(June_2005).pdf	358K
2005.Langmuir.Yi.signal dir seq assy.Langmuir 21 (6) 2104-2107 (Mar 15 2005).pdf	152K
2005.NanoLett.Yi.virus assy.NanoLett 5(10)_1931-36_(2005).pdf	502K
2005.RevSciInstr.Choo.Spatial_CVD_Combi.RevSciInstr_76_062217_(June_1_2005).pdf	1501K
2005.RevSciInstr.Takeuchi.Data_mgmt_xray_ternary.RevSciInstr_76_062223_(June_1_2005).pdf	626K
2005.SPIE.Powers.Toward_Biophotonic_MEMS_Cel_ Sensor.Seville_Spain.pdf	387K
2005.uTAS.Park.bioMEMS-pkg.pdf	467K
2006.Electrochemica_Acta.Zangmeister.Electrochemical_chitosan.pdf	514K
2006.JVST.Lei.ALD_dynamics.pdf	460K
2006.J_Cryst_Growth.Parikh.GaN_growth_kinetics.pdf	464K
2006.Lab_on_Chip.Park.biomolec_assy_pkged_microfluidics.pdf	606K
2007.JCrystGrowth.Sreenivasan.combi-CVD.pdf	2694K
2007.JVST.Cai.multiplex-massspec-prog-CVD.pdf	1269K
2007.JVST.Lecordier.ALD_metrology.pdf	957K
2007.JVST.Sreenivasan.spat_prog_CVD_demo.pdf	1186K
2007.LabChip.Koev.DNA-dopamine_sensing_chitos_cantilever.pdf	445K
2007.Langmuir.Yi.TMV_microarray.pdf	649K
2007.Mat-Sci-Forum.Ponczak.SiC_epi_massspec.pdf	760K
2007.MetabEng.Fernandes.mag_nanofactories.pdf	206K
2007.Nature_Nanotech.Leduc.InVivo_Biofactory.pdf	392K
2007.uTAS.GFP-DNA-chit-bioMEMS.pdf	850K
2007.uTAS.Luo.pfs-assy-activity-bioMEMS.pdf	328K
2008.Biomed-Microdev.Luo.des_optimiz_bioMEMS_enzyme.pdf	912K
2008.Biotech-Bioeng.Lewandowski.pfs-chip.pdf	316K
2008.LabChip.Luo.pfs-bioMEMS.pdf	493K
2008.LabChip.Luo.pfs-bioMEMS.suppl.pdf	102K
2008.Macromolec-Biosci.Shi.ChitosanBiotinylation.pdf	219K
2008.PhysToday.Margaritondo.synchrad_tantalus_I.May2008.pdf	720K
2008.Small.Perez.TEM_metrol_AAO-ALD.pdf	483K
_vti_cnf	dir
publications.php	4K

Contact Gary W. Rubloff Minta Martin Professor of Engineering Director, Maryland NanoCenter 2145 A.V. Williams Bldg University of Maryland College Park, MD 20742-3285 301 405-2949