Presentations

Title	Authors	Symposium	Size (Kb)
Real-time in-situ chemical sensing in GaN MOCVD for advanced process control	S. Cho, G.W. Rubloff, M.E. Aumer, D.B. Thomson, D.P. Partlow	50th Annual Symposium of the American Vacuum Society, Baltimore, Nov. 2003	602
Processing and characterization of PMSSQ based materials for nanoporous low K dielectrics	P. Lazzeri, L. Vanzetti, M. Bersani, M. Anderle, J.J. Park, Z. Lin, R.M. Briber, G.W. Rubloff, R.D. Miller	50th Annual Symposium of the American Vacuum Society, Baltimore, Nov. 2003	750
Simulator development and prototype evaluation for a spatially controllable chemical vapor deposition system	J.-O. Choo, R. Adomaitis, L. Henn-Lecordier, G.W. Rubloff, Y. Liu	AIChE (American Institute of Chemical Engineering) annual meeting, San Francisco, Nov. 2002	1202
Monitoring and control of binary gas mixtures from solid phase MOCVD sources using an acoustic sensor	L. Henn-Lecordier, J.N. Kidder, G.W. Rubloff	49th Annual Symposium of the American Vacuum Society, Denver CO, Nov. 2002	414
Spatially programmable reactor design: toward a new paradigm for equipment effectiveness	Y. Liu, J. Choo, L. Henn-Lecordier, G. Rubloff, R. Adomaitis	49th Annual Symposium of the American Vacuum Society, Denver CO, Nov. 2002	811
Dynamic simulation and optimization at the unit process level for environmentally benign semiconductor manufacturing	S. Cho, W. Lei and G. Rubloff	49th Annual Symposium of the American Vacuum Society, Denver CO, Nov. 2002	612
Thickness metrology and real-time endpoint control in CVD using in-situ mass spectrometry	S. Cho, Y. Xu, L. Henn-Lecordier, Y. Liu, G.W. Rubloff	48th Annual Symposium of the American Vacuum Society, San Francisco CA, Oct. 2001	522
Real-time CVD wafer state metrology using an acoustic sensor	L. Henn-Lecordier, J.N. Kidder, G.W. Rubloff, C. Gogol, and A Wajid	48th Annual Symposium of the American Vacuum Society, San Francisco CA, Oct. 2001	173
Influence of gas composition on wafer temperature in a W CVD reactor: experimental measurements, model development, and parameter identification	H.-Y. Chang, R.A. Adomaitis, J.N. Kidder, G.W. Rubloff	AIChE (American Institute of Chemical Engineering) annual meeting, Nov. 2000	594
Surfaces, Interfaces, and Chemical Reactions in Semiconductor Technology and Manufacturing	G.W. Rubloff	AVS Gaede-Langmuir Prize 2000 Award Lecture, 48th Annual Symposium of the American Vacuum Society, Boston, MA, Oct. 2000	1,526
Guiding manufacturing from process mechanisms to factory operations	G.W. Rubloff	47th Annual Symposium of the American Vacuum Society, Boston, MA, Oct. 2000	797
Integrating process models, equipment logistics, and factory flow for manufacturing systems optimization	L. Henn-Lecordier, M.-Q. Nguyen, B. Conaghan, P. Mellacheruvu, J.W. Herrmann, and G.W. Rubloff	47th Annual Symposium of the American Vacuum Society, Boston, MA, Oct. 2000	144
W-CVD film thickness metrology and process control using mass spectrometry	Y. Xu. T. Gougousi, R. Sreenivasan, G.W. Rubloff, J.N. Kidder, and E. Zafiriou	47th Annual Symposium of the American Vacuum Society, Boston, MA, Oct. 2000	293
Reaction sensing in multi-component CVD processes using an acoustic sensor	L. Henn-Lecordier, J.N. Kidder, G.W. Rubloff, C. Gogol, and A Wajid	46th Annual Symposium of the American Vacuum Society, Seattle, OR, Oct. 1999	316
EquiPSim: hands-on training in semiconductor equipment and process behavior	A.R. Rose, N. Kositsyna, N. Gupta, R. Sreenivasan, W.S. Levine, and G.W. Rubloff	46th Annual Symposium of the American Vacuum Society, Seattle, OR, Oct. 1999	1,415
Chemical sensing and sensor-based metrology using mass spectrometry in multi-component reaction systems	Y. Xu, T. Gougousi, N. Gupta, J.N. Kidder, and G.W Rubloff	46th Annual Symposium of the American Vacuum Society, Seattle, OR, Oct. 1999	649
Challenges for Real-Time Control in Reactive Semiconductor Manufacturing Process Environments	G.W. Rubloff	45th Annual Symposium of the American Vacuum Society, Nov. 2-6, 1998, Baltimore, MD	745
Sensor Integration on a W CVD Cluster Tool for Real-time Process Monitoring and Control	J.N. Jidder, Y. Xu, N. Gupta, T. Gougousi, L. Henn-Lecordier, G.W. Rubloff	45th Annual Symposium of the American Vacuum Society, Nov. 2-6, 1998, Baltimore, MD	387
Semiconductor Manufacturing Education and Training: Graphical User Interface (GUI) Design Issues	Oveissi, M., Eckard, D., Rose, A., Shneiderman, B., and Rubloff, G. W.	44 th Annual Symposium of the American Vacuum Society, Oct. 20-24, 1997, San Jose, CA