Dr. Gary W. Rubloff
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Process diagnostics, sensing, metrology, and control
Semiconductor manufacturing processes and equipment
Systems modeling, simulation, and optimization
Engineered learning systems

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All materials at this site are copyrighted 2003 by the University of Maryland
1996-2003, all rights reserved

Recent research results:
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Semiconductor manufacturing processes and equipment
Process sensing, metrology, and control
Systems modeling, simulation, and optimization
Engineered learning systems
General

                                  

Title Authors Symposium Size (Kb)
Real-time in-situ chemical sensing in GaN MOCVD for advanced process control S. Cho, G.W. Rubloff, M.E. Aumer, D.B. Thomson, D.P. Partlow 50th Annual Symposium of the American Vacuum Society, Baltimore, Nov. 2003 602
Processing and characterization of PMSSQ based materials for nanoporous low K dielectrics P. Lazzeri, L. Vanzetti, M. Bersani, M. Anderle, J.J. Park, Z. Lin, R.M. Briber, G.W. Rubloff, R.D. Miller 50th Annual Symposium of the American Vacuum Society, Baltimore, Nov. 2003 750
Simulator development and prototype evaluation for a spatially controllable chemical vapor deposition system J.-O. Choo, R. Adomaitis, L. Henn-Lecordier, G.W. Rubloff, Y. Liu  AIChE (American Institute of Chemical Engineering) annual meeting, San Francisco, Nov. 2002 1202
Monitoring and control of binary gas mixtures from solid phase MOCVD sources using an acoustic sensor L. Henn-Lecordier, J.N. Kidder, G.W. Rubloff 49th Annual Symposium of the American Vacuum Society, Denver CO, Nov. 2002 414
Spatially programmable reactor design: toward a new paradigm for equipment effectiveness Y. Liu, J. Choo, L. Henn-Lecordier, G. Rubloff, R. Adomaitis 49th Annual Symposium of the American Vacuum Society, Denver CO, Nov. 2002 811
Dynamic simulation and optimization at the unit process level for environmentally benign semiconductor manufacturing S. Cho, W. Lei and G. Rubloff 49th Annual Symposium of the American Vacuum Society, Denver CO, Nov. 2002 612
Thickness metrology and real-time endpoint control in CVD using in-situ mass spectrometry S. Cho, Y. Xu, L. Henn-Lecordier, Y. Liu, G.W. Rubloff 48th Annual Symposium of the American Vacuum Society, San Francisco CA, Oct. 2001 522
Real-time CVD wafer state metrology using an acoustic sensor L. Henn-Lecordier, J.N. Kidder, G.W. Rubloff, C. Gogol, and A Wajid 48th Annual Symposium of the American Vacuum Society, San Francisco CA, Oct. 2001 173
Influence of gas composition on wafer temperature in a W CVD reactor: experimental measurements, model development, and parameter identification H.-Y. Chang, R.A. Adomaitis, J.N. Kidder, G.W. Rubloff AIChE (American Institute of Chemical Engineering) annual meeting,  Nov. 2000 594
Surfaces, Interfaces, and Chemical Reactions in Semiconductor Technology and Manufacturing G.W. Rubloff AVS Gaede-Langmuir Prize 2000 Award Lecture, 48th Annual Symposium of the American Vacuum Society, Boston, MA, Oct. 2000 1,526
Guiding manufacturing from process mechanisms to factory operations G.W. Rubloff 47th Annual Symposium of the American Vacuum Society, Boston, MA, Oct. 2000 797
Integrating process models, equipment logistics, and factory flow for manufacturing systems optimization  L. Henn-Lecordier, M.-Q. Nguyen, B. Conaghan, P. Mellacheruvu,  J.W. Herrmann, and G.W. Rubloff 47th Annual Symposium of the American Vacuum Society, Boston, MA, Oct. 2000 144
W-CVD film thickness metrology and process control using mass spectrometry Y. Xu. T. Gougousi, R. Sreenivasan, G.W. Rubloff, J.N. Kidder, and E. Zafiriou 47th Annual Symposium of the American Vacuum Society, Boston, MA, Oct. 2000 293
Reaction sensing in multi-component CVD processes using an acoustic sensor L. Henn-Lecordier, J.N. Kidder, G.W. Rubloff, C. Gogol, and A Wajid 46th Annual Symposium of the American Vacuum Society, Seattle, OR, Oct. 1999 316
EquiPSim: hands-on training in semiconductor equipment and process behavior A.R. Rose, N. Kositsyna, N. Gupta, R. Sreenivasan, W.S. Levine, and G.W. Rubloff 46th Annual Symposium of the American Vacuum Society, Seattle, OR, Oct. 1999 1,415
Chemical sensing and sensor-based metrology using  mass spectrometry in multi-component reaction systems Y. Xu, T. Gougousi, N. Gupta, J.N. Kidder, and G.W Rubloff 46th Annual Symposium of the American Vacuum Society, Seattle, OR, Oct. 1999 649
Challenges for Real-Time Control in Reactive Semiconductor Manufacturing Process Environments G.W. Rubloff 45th Annual Symposium of the American Vacuum Society, Nov. 2-6, 1998, Baltimore, MD 745
Sensor Integration on a W CVD Cluster Tool for Real-time Process Monitoring and Control J.N. Jidder, Y. Xu, N. Gupta, T. Gougousi, L. Henn-Lecordier, G.W. Rubloff 45th Annual Symposium of the American Vacuum Society, Nov. 2-6, 1998, Baltimore, MD 387
Semiconductor Manufacturing Education and Training: Graphical User Interface (GUI) Design Issues Oveissi, M., Eckard, D., Rose, A., Shneiderman, B., and Rubloff, G. W.  44 th Annual Symposium of the American Vacuum Society, Oct. 20-24, 1997, San Jose, CA